JPS62201302A - アライメントマ−ク検出方法 - Google Patents

アライメントマ−ク検出方法

Info

Publication number
JPS62201302A
JPS62201302A JP62035334A JP3533487A JPS62201302A JP S62201302 A JPS62201302 A JP S62201302A JP 62035334 A JP62035334 A JP 62035334A JP 3533487 A JP3533487 A JP 3533487A JP S62201302 A JPS62201302 A JP S62201302A
Authority
JP
Japan
Prior art keywords
wafer
light
mark detection
alignment mark
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62035334A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0344641B2 (en]
Inventor
Akiyoshi Suzuki
章義 鈴木
Masao Totsuka
戸塚　正雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62035334A priority Critical patent/JPS62201302A/ja
Publication of JPS62201302A publication Critical patent/JPS62201302A/ja
Publication of JPH0344641B2 publication Critical patent/JPH0344641B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
JP62035334A 1987-02-18 1987-02-18 アライメントマ−ク検出方法 Granted JPS62201302A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62035334A JPS62201302A (ja) 1987-02-18 1987-02-18 アライメントマ−ク検出方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62035334A JPS62201302A (ja) 1987-02-18 1987-02-18 アライメントマ−ク検出方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP58090194A Division JPS58213207A (ja) 1983-05-23 1983-05-23 アライメントマーク検出方法

Publications (2)

Publication Number Publication Date
JPS62201302A true JPS62201302A (ja) 1987-09-05
JPH0344641B2 JPH0344641B2 (en]) 1991-07-08

Family

ID=12438937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62035334A Granted JPS62201302A (ja) 1987-02-18 1987-02-18 アライメントマ−ク検出方法

Country Status (1)

Country Link
JP (1) JPS62201302A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021051306A (ja) * 2019-09-20 2021-04-01 ライカ マイクロシステムズ シーエムエス ゲゼルシャフト ミット ベシュレンクテル ハフツングＬｅｉｃａ Ｍｉｃｒｏｓｙｓｔｅｍｓ ＣＭＳ ＧｍｂＨ 交換可能な光学素子を有するライトシート顕微鏡

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021051306A (ja) * 2019-09-20 2021-04-01 ライカ マイクロシステムズ シーエムエス ゲゼルシャフト ミット ベシュレンクテル ハフツングＬｅｉｃａ Ｍｉｃｒｏｓｙｓｔｅｍｓ ＣＭＳ ＧｍｂＨ 交換可能な光学素子を有するライトシート顕微鏡

Also Published As

Publication number Publication date
JPH0344641B2 (en]) 1991-07-08

Similar Documents

Publication Publication Date Title
JPS593791B2 (ja) 物体の像認識方法
US7551273B2 (en) Mask defect inspection apparatus
US4402596A (en) Projection type exposure device
JPH0140490B2 (en])
US4614432A (en) Pattern detector
US5966216A (en) On-axix mask and wafer alignment system
US5448350A (en) Surface state inspection apparatus and exposure apparatus including the same
US11231573B2 (en) Position detection apparatus, exposure apparatus, and article manufacturing method
JPS62201302A (ja) アライメントマ−ク検出方法
US7760349B2 (en) Mask-defect inspecting apparatus with movable focusing lens
JPH0344242B2 (en])
JP3327627B2 (ja) 露光用原板及びそれを用いた投影露光装置
JPH10172900A (ja) 露光装置
US4779986A (en) Reduction projection system alignment method and apparatus
JPH0934134A (ja) アライメント装置
JPH0121615B2 (en])
JP2010135475A (ja) 露光装置およびデバイス製造方法
JPS6242112A (ja) 光路長補償光学系
JPS60249325A (ja) 投影露光装置
JPS63107114A (ja) 投影光学装置
JP3584299B2 (ja) アライメント装置
JP2011017714A (ja) マスク欠陥検査装置
JPH10335245A (ja) 露光装置
JPH0771918A (ja) 寸法測定装置
JPS63175421A (ja) アライメント装置